Laboratory of Tandetron (LT)

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The accelerator Tandetron 4130 MC, put into operation in 2005, is used for production of ion beams with energies in the range from 400 keV to 30 MeV of almost all elements of the periodic system for the trace element analysis by means of the nuclear analytical methods. It is the medium-current (MC) version with a terminal voltage varying from 200 kV to 3 MV.

The main laboratory accessories are devices for material characterization by standard nuclear analytical techniques (RBS, RBS-channeling, ERDA, ERDA-TOF, PIXE, PIGE, and Ion-Microprobe with less than 1 μm lateral resolution) and for high-energy implantation. Broad portfolio of Ion Beam Analytical methods is used in material research in optics, nanooptics and electronics, bionics, dosimetry, doping of semiconductors, space and nuclear power technologies, wear resistant materials etc. Heavy and light ion microprobe is effectively used for ion beam lithography and 3D elemental mapping using ion microprobe in combination with STIM, PIXE, PIGE and RBS), respectively. Versatile ion implantation instrumentation is used for modification, intentional defect engineering, nanostructuring of materials as well as for ionizing radiation testing in dosimetry and detector development, where also external beam is for disposal. Analytical methods are successfully and effectively used in many applications: ion beam interaction with solids, nanostructuring, nano and micro-structure synthesis and characterization, quantitative and qualitative elemental analysis and high resolution elemental depth profiling, trace element characterization etc.

Material research belongs to traditionally progressive fields of technology. However, due to the continuous miniaturization, the underlying structures are far beyond the analytical limits of the most of conventional methods. Nuclear analytical methods provide this possibility as they use probes of similar or much smaller dimensions (particles, radiation).

LT is equipped with small deposition and complementary analytics laboratory including layer deposition techniques (CVD, two-magnetron sputtering system for various metal and bi-metal coating deposition, laser source for irradiation, ablation and microstructuring) and analytical methods (optical ellipsometry, optical analysis in UV Vis-NIR range of wavelengths).

Staff qualification and the parameters of the experimental devices of the laboratory are fully comparable to similar ones worldwide. With this equipment the laboratory is unique in the Czech Republic and it is able to meet all specific demands of Czech and foreign research organizations.